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Source: Crop Microclimate Management news release

Crop Microclimate Management introduces to the U.S. corn and soybean market a proprietary and unique mode-of-action product to enhance crop productivity by reducing the yield-robbing effects of extreme heat, cold, drought, moisture and

PHOTON® SG contains a class of natural plant compounds (dicarboxylic acids) as a 50 percent soluble granule. Effective at very low rates - just 0.3 to 0.6 oz. (wt.) of product per acre - this globally proven technology provides a low-cost, efficacious and naturally occurring non-pesticide alternative to existing yield-enhancing products.

"Realize that up to 60 percent of all crop loss is caused by crop stress, which is why we've seen rapidly increasing global use and development of this product in areas such as Australia, South Africa and Chile," according to Crop Microclimate President Chuck Kupatt, PhD. "Even in a 'normal' growing season, crops are stressed at some time on a daily basis."

PHOTON stimulates a key stress-sensing enzyme system in plants to prepare them to react quickly and effectively to environmental stresses, like excessive temperatures (heat or cold), drought, flooding, salinity and high radiation.

PHOTON is systematically taken up by the plant within 24 hours of application, and remains effective for weeks. For corn, soybeans and other row crops, applications are timed to the growth stages most susceptible to abiotic stressors, to maximize treatment effects.

PHOTON is used throughout the world on a wide range of crops, but Dr. Kupatt expects initial adoption in the United States by corn and soybean growers, followed by canola, and cereals in subsequent seasons. U.S. distribution is in place this season for a limited number of acres.

"Few crop protection products address environmental stressors, instead they tend to focus upon living threats like weeds, insects and fungi," Dr. Kupatt said. "The next step in improving grower productivity, and therefore profitability, is to reduce the negative impact of environmental stress."

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